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Feature Story 
September 13, 2007
Lighter gas reduces damage to optics in extreme ultraviolet lithography

From EurekAlert! - Breaking News:

Researchers at the University of Illinois have discovered a way to generate light and reduce damage in a leading candidate for next-generation microelectronics lithography. The technique could help pack more power into smaller computer chips. Read more from this post.
Posted on September 13, 2007 5:01 PM

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